Machine Learning for Electronic Design Automation: A Survey

In recent years, with the development of semiconductor technology, the scale of integrated circuit (IC) has grown exponentially, challenging the scalability and reliability of the circuit design flow. Therefore, EDA algorithms and software are required to be more effective and efficient to deal with extremely large search space with low latency. Machine learning (ML) is taking an important role in our lives these days, which has been widely used in many scenarios. ML methods, including traditional and deep learning algorithms, achieve amazing performance in solving classification, detection, and design space exploration problems. Additionally, ML methods show great potential to generate high-quality solutions for many NP-complete (NPC) problems, which are common in the EDA field, while traditional methods lead to huge time and resource consumption to solve these problems. Traditional methods usually solve every problem from the beginning, with a lack of knowledge accumulation. Instead, ML algorithms focus on extracting high-level features or patterns that can be reused in other related or similar situations, avoiding repeated complicated analysis. Therefore, applying machine learning methods is a promising direction to accelerate the solving of EDA problems. These authors are ordered alphabetically.