The discovery of new materials is essential for enabling technological advancements. Computational approaches for predicting novel materials must effectively learn the manifold of stable crystal structures within an infinite design space. We introduce Open Materials Generation (OMG), a unifying framework for the generative design and discovery of inorganic crystalline materials. OMG employs stochastic interpolants (SI) to bridge an arbitrary base distribution to the target distribution of inorganic crystals via a broad class of tunable stochastic processes, encompassing both diffusion models and flow matching as special cases. In this work, we adapt the SI framework by integrating an equivariant graph representation of crystal structures and extending it to account for periodic boundary conditions in unit cell representations. Additionally, we couple the SI flow over spatial coordinates and lattice vectors with discrete flow matching for atomic species. We benchmark OMG's performance on two tasks: Crystal Structure Prediction (CSP) for specified compositions, and 'de novo' generation (DNG) aimed at discovering stable, novel, and unique structures. In our ground-up implementation of OMG, we refine and extend both CSP and DNG metrics compared to previous works. OMG establishes a new state-of-the-art in generative modeling for materials discovery, outperforming purely flow-based and diffusion-based implementations. These results underscore the importance of designing flexible deep learning frameworks to accelerate progress in materials science.

The remarkable reasoning and code generation capabilities of large language models (LLMs) have spurred significant interest in applying LLMs to enable task automation in digital chip design. In particular, recent work has investigated early ideas of applying these models to formal verification (FV), an approach to verifying hardware implementations that can provide strong guarantees of confidence but demands significant amounts of human effort. While the value of LLM-driven automation is evident, our understanding of model performance, however, has been hindered by the lack of holistic evaluation. In response, we present FVEval, the first comprehensive benchmark and evaluation framework for characterizing LLM performance in tasks pertaining to FV. The benchmark consists of three sub-tasks that measure LLM capabilities at different levels: from the generation of SystemVerilog assertions (SVAs) given natural language descriptions to reasoning about the design RTL and suggesting assertions directly without additional human input. As test instances, we present both collections of expert-written verification collateral and methodologies to scalably generate synthetic examples aligned with industrial FV workflows. A wide range of existing LLMs, both proprietary and open-source, are evaluated against FVEval, based on which we investigate where today's LLMs stand and how we might further enable their application toward improving productivity in digital FV. Our benchmark and evaluation code is available at \url{https://github.com/NVlabs/FVEval}.

Despite the significant progress made in code generation with large language models, challenges persist, especially with hardware description languages such as Verilog. This paper first presents an analysis of fine-tuned LLMs on Verilog coding, with synthetic data from prior methods. We identify two main issues: difficulties in handling non-textual representations (Karnaugh maps, state-transition diagrams and waveforms) and significant variability during training with models randomly making "minor" mistakes. To address these limitations, we enhance data curation by creating correct-by-construction data targeting non-textual representations. Additionally, we introduce an automated framework that generates error reports from various model checkpoints and injects these errors into open-source code to create targeted code repair data. Our fine-tuned Starcoder2-15B outperforms prior state-of-the-art results by 3.8%, 10.9%, 6.6% for pass@1 on VerilogEval-Machine, VerilogEval-Human, and RTLLM.

Recent work targeting large language models (LLMs) for code generation demonstrated that increasing the amount of training data through synthetic code generation often leads to exceptional performance. In this paper we explore data pruning methods aimed at enhancing the efficiency of model training specifically for code LLMs. We present techniques that integrate various clustering and pruning metrics to selectively reduce training data without compromising the accuracy and functionality of the generated code. We observe significant redundancies in synthetic training data generation, where our experiments demonstrate that benchmark performance can be largely preserved by training on only 10% of the data. Moreover, we observe consistent improvements in benchmark results through moderate pruning of the training data. Our experiments show that these pruning strategies not only reduce the computational resources needed but also enhance the overall quality code generation.

This paper presents a comparative analysis of total cost of ownership (TCO) and performance between domain-adapted large language models (LLM) and state-of-the-art (SoTA) LLMs , with a particular emphasis on tasks related to coding assistance for chip design. We examine the TCO and performance metrics of a domain-adaptive LLM, ChipNeMo, against two leading LLMs, Claude 3 Opus and ChatGPT-4 Turbo, to assess their efficacy in chip design coding generation. Through a detailed evaluation of the accuracy of the model, training methodologies, and operational expenditures, this study aims to provide stakeholders with critical information to select the most economically viable and performance-efficient solutions for their specific needs. Our results underscore the benefits of employing domain-adapted models, such as ChipNeMo, that demonstrate improved performance at significantly reduced costs compared to their general-purpose counterparts. In particular, we reveal the potential of domain-adapted LLMs to decrease TCO by approximately 90%-95%, with the cost advantages becoming increasingly evident as the deployment scale expands. With expansion of deployment, the cost benefits of ChipNeMo become more pronounced, making domain-adaptive LLMs an attractive option for organizations with substantial coding needs supported by LLMs

The increasing popularity of large language models (LLMs) has paved the way for their application in diverse domains. This paper proposes a benchmarking framework tailored specifically for evaluating LLM performance in the context of Verilog code generation for hardware design and verification. We present a comprehensive evaluation dataset consisting of 156 problems from the Verilog instructional website HDLBits. The evaluation set consists of a diverse set of Verilog code generation tasks, ranging from simple combinational circuits to complex finite state machines. The Verilog code completions can be automatically tested for functional correctness by comparing the transient simulation outputs of the generated design with a golden solution. We also demonstrate that the Verilog code generation capability of pretrained language models could be improved with supervised fine-tuning by bootstrapping with LLM generated synthetic problem-code pairs.

ChipNeMo aims to explore the applications of large language models (LLMs) for industrial chip design. Instead of directly deploying off-the-shelf commercial or open-source LLMs, we instead adopt the following domain adaptation techniques: custom tokenizers, domain-adaptive continued pretraining, supervised fine-tuning (SFT) with domain-specific instructions, and domain-adapted retrieval models. We evaluate these methods on three selected LLM applications for chip design: an engineering assistant chatbot, EDA script generation, and bug summarization and analysis. Our results show that these domain adaptation techniques enable significant LLM performance improvements over general-purpose base models across the three evaluated applications, enabling up to 5x model size reduction with similar or better performance on a range of design tasks. Our findings also indicate that there's still room for improvement between our current results and ideal outcomes. We believe that further investigation of domain-adapted LLM approaches will help close this gap in the future.

Lithography modeling is a crucial problem in chip design to ensure a chip design mask is manufacturable. It requires rigorous simulations of optical and chemical models that are computationally expensive. Recent developments in machine learning have provided alternative solutions in replacing the time-consuming lithography simulations with deep neural networks. However, the considerable accuracy drop still impedes its industrial adoption. Most importantly, the quality and quantity of the training dataset directly affect the model performance. To tackle this problem, we propose a litho-aware data augmentation (LADA) framework to resolve the dilemma of limited data and improve the machine learning model performance. First, we pretrain the neural networks for lithography modeling and a gradient-friendly StyleGAN2 generator. We then perform adversarial active sampling to generate informative and synthetic in-distribution mask designs. These synthetic mask images will augment the original limited training dataset used to finetune the lithography model for improved performance. Experimental results demonstrate that LADA can successfully exploits the neural network capacity by narrowing down the performance gap between the training and testing data instances.