deoxidation
Universal Deoxidation of Semiconductor Substrates Assisted by Machine-Learning and Real-Time-Feedback-Control
Shen, Chao, Zhan, Wenkang, Tang, Jian, Wu, Zhaofeng, Xu, Bo, Zhao, Chao, Wang, Zhanguo
Thin film deposition is an essential step in the semiconductor process. During preparation or loading, the substrate is exposed to the air unavoidably, which has motivated studies of the process control to remove the surface oxide before thin film deposition. Optimizing the deoxidation process in molecular beam epitaxy (MBE) for a random substrate is a multidimensional challenge and sometimes controversial. Due to variations in semiconductor materials and growth processes, the determination of substrate deoxidation temperature is highly dependent on the grower's expertise; the same substrate may yield inconsistent results when evaluated by different growers. Here, we employ a machine learning (ML) hybrid convolution and vision transformer (CNN-ViT) model. This model utilizes reflection high-energy electron diffraction (RHEED) video as input to determine the deoxidation status of the substrate as output, enabling automated substrate deoxidation under a controlled architecture. This also extends to the successful application of deoxidation processes on other substrates. Furthermore, we showcase the potential of models trained on data from a single MBE equipment to achieve high-accuracy deployment on other equipment. In contrast to traditional methods, our approach holds exceptional practical value. It standardizes deoxidation temperatures across various equipment and substrate materials, advancing the standardization research process in semiconductor preparation, a significant milestone in thin film growth technology. The concepts and methods demonstrated in this work are anticipated to revolutionize semiconductor manufacturing in optoelectronics and microelectronics industries by applying them to diverse material growth processes.
Monitoring MBE substrate deoxidation via RHEED image-sequence analysis by deep learning
Khaireh-Walieh, Abdourahman, Arnoult, Alexandre, Plissard, Sébastien, Wiecha, Peter R.
Reflection high-energy electron diffraction (RHEED) is a powerful tool in molecular beam epitaxy (MBE), but RHEED images are often difficult to interpret, requiring experienced operators. We present an approach for automated surveillance of GaAs substrate deoxidation in MBE reactors using deep learning based RHEED image-sequence classification. Our approach consists of an non-supervised auto-encoder (AE) for feature extraction, combined with a supervised convolutional classifier network. We demonstrate that our lightweight network model can accurately identify the exact deoxidation moment. Furthermore we show that the approach is very robust and allows accurate deoxidation detection during months without requiring re-training. The main advantage of the approach is that it can be applied to raw RHEED images without requiring further information such as the rotation angle, temperature, etc.
- Europe > France > Occitanie > Haute-Garonne > Toulouse (0.05)
- North America > United States > New York (0.04)
- Europe > United Kingdom > England > Cambridgeshire > Cambridge (0.04)