Large language models (LLMs) achieve impressive performance by scaling model parameters, but this comes with significant inference overhead. Feed-forward networks (FFNs), which dominate LLM parameters, exhibit high activation sparsity in hidden neurons. To exploit this, researchers have proposed using a mixture-of-experts (MoE) architecture, where only a subset of parameters is activated. However, existing approaches often require extensive training data and resources, limiting their practicality. We propose CMoE (Carved MoE), a novel framework to efficiently carve MoE models from dense models. CMoE achieves remarkable performance through efficient expert grouping and lightweight adaptation. First, neurons are grouped into shared and routed experts based on activation rates. Next, we construct a routing mechanism without training from scratch, incorporating a differentiable routing process and load balancing. Using modest data, CMoE produces a well-designed, usable MoE from a 7B dense model within five minutes. With lightweight fine-tuning, it achieves high-performance recovery in under an hour. We make our code publicly available at https://github.com/JarvisPei/CMoE.

Generative Pre-trained Transformers (GPTs) have demonstrated remarkable performance across diverse domains through the extensive scaling of model parameters. Recent works observe the redundancy across the transformer blocks and develop compression methods by structured pruning of the unimportant blocks. However, such straightforward elimination will always provide irreversible performance degradation. In this paper, we propose FuseGPT, a novel methodology to recycle the pruned transformer blocks to further recover the model performance. Firstly we introduce a new importance detection metric, Macro Influence (MI), to detect the long-term influence of each transformer block by calculating their loss of information after removal. Then we propose group-level layers fusion, which adopts the parameters in layers of the unimportant blocks and injects them into the corresponding layers inside the neighboring blocks. The fusion is not one-off but through iterative parameter updates by lightweight group-level fine-tuning. Specifically, these injected parameters are frozen but weighted with learnable rank decomposition matrices to reduce the overhead during fine-tuning. Our approach not only works well on large language models but also on large multimodal models. The experiments have shown that, by using modest amounts of data, FuseGPT can outperform previous works in both perplexity and zero-shot task performance.

Due to the growing complexity of modern Integrated Circuits (ICs), there is a need for automated circuit design methods. Recent years have seen rising research in hardware design language generation to facilitate the design process. In this work, we propose a Verilog generation framework, BetterV, which fine-tunes the large language models (LLMs) on processed domain-specific datasets and incorporates generative discriminators for guidance on particular design demands. The Verilog modules are collected, filtered and processed from internet to form a clean and abundant dataset. Instruct-tuning methods are specially designed to fine-tuned the LLMs to understand the knowledge about Verilog. Furthermore, data are augmented to enrich the training set and also used to train a generative discriminator on particular downstream task, which leads a guidance for the LLMs to optimize the Verilog implementation. BetterV has the ability to generate syntactically and functionally correct Verilog, which can outperform GPT-4 on the VerilogEval-machine benchmark. With the help of task-specific generative discriminator, BetterV can achieve remarkable improvement on various electronic design automation (EDA) downstream tasks, including the netlist node reduction for synthesis and verification runtime reduction with Boolean Satisfiability (SAT) solving.

Lithography is fundamental to integrated circuit fabrication, necessitating large computation overhead. The advancement of machine learning (ML)-based lithography models alleviates the trade-offs between manufacturing process expense and capability. However, all previous methods regard the lithography system as an image-to-image black box mapping, utilizing network parameters to learn by rote mappings from massive mask-to-aerial or mask-to-resist image pairs, resulting in poor generalization capability. In this paper, we propose a new ML-based paradigm disassembling the rigorous lithographic model into non-parametric mask operations and learned optical kernels containing determinant source, pupil, and lithography information. By optimizing complex-valued neural fields to perform optical kernel regression from coordinates, our method can accurately restore lithography system using a small-scale training dataset with fewer parameters, demonstrating superior generalization capability as well. Experiments show that our framework can use 31% of parameters while achieving 69$\times$ smaller mean squared error with 1.3$\times$ higher throughput than the state-of-the-art.