LithoBench: Benchmarking AI Computational Lithography for Semiconductor Manufacturing

Computational lithography provides algorithmic and mathematical support for resolution enhancement in optical lithography, which is the critical step in semiconductor manufacturing. The time-consuming lithography simulation and mask optimization processes limit the practical application of inverse lithography technology (ILT), a promising solution to the challenges of advanced-node lithography. Although various machine learning methods for ILT have shown promise for reducing the computational burden, this field is in lack of a dataset that can train the models thoroughly and evaluate the performance comprehensively. To boost the development of AI-driven computational lithography, we present the LithoBench dataset, a collection of circuit layout tiles for deep-learning-based lithography simulation and mask optimization. LithoBench consists of more than 120k tiles that are cropped from real circuit designs or synthesized according to the layout topologies of famous ILT testcases.