Semi-supervised few-shot learning consists in training a classifier to adapt to new tasks with limited labeled data and a fixed quantity of unlabeled data. Many sophisticated methods have been developed to address the challenges this problem comprises. In this paper, we propose a simple but quite effective approach to predict accurate negative pseudo-labels of unlabeled data from an indirect learning perspective, and then augment the extremely label-constrained support set in few-shot classification tasks. Our approach can be implemented in just few lines of code by only using off-the-shelf operations, yet it is able to outperform state-of-the-art methods on four benchmark datasets.

Semi-supervised few-shot learning consists in training a classifier to adapt to new tasks with limited labeled data and a fixed quantity of unlabeled data. Many sophisticated methods have been developed to address the challenges this problem comprises. In this paper, we propose a simple but quite effective approach to predict accurate negative pseudo-labels of unlabeled data from an indirect learning perspective, and then augment the extremely label-constrained support set in few-shot classification tasks. Our approach can be implemented in just few lines of code by only using off-the-shelf operations, yet it is able to outperform state-of-the-art methods on four benchmark datasets.

Identifying defect patterns in a wafer map during manufacturing is crucial to find the root cause of the underlying issue and provides valuable insights on improving yield in the foundry. Currently used methods use deep neural networks to identify the defects. These methods are generally very huge and have significant inference time. They also require GPU support to efficiently operate. All these issues make these models not fit for on-line prediction in the manufacturing foundry. In this paper, we propose an extremely simple yet effective technique to extract features from wafer images. The proposed method is extremely fast, intuitive, and non-parametric while being explainable. The experiment results show that the proposed pipeline outperforms conventional deep learning models. Our feature extraction requires no training or fine-tuning while preserving the relative shape and location of data points as revealed by our interpretability analysis.

Multiple Instance Learning (MIL) is a weak supervision learning paradigm that allows modeling of machine learning problems in which labels are available only for groups of examples called bags. A positive bag may contain one or more positive examples but it is not known which examples in the bag are positive. All examples in a negative bag belong to the negative class. Such problems arise frequently in fields of computer vision, medical image processing and bioinformatics. Many neural network based solutions have been proposed in the literature for MIL, however, almost all of them rely on introducing specialized blocks and connectivity in the architectures. In this paper, we present a novel and effective approach to Multiple Instance Learning in neural networks. Instead of making changes to the architectures, we propose a simple bag-level ranking loss function that allows Multiple Instance Classification in any neural architecture. We have demonstrated the effectiveness of our proposed method for popular MIL benchmark datasets. In addition, we have tested the performance of our method in convolutional neural networks used to model an MIL problem derived from the well-known MNIST dataset. Results have shown that despite being simpler, our proposed scheme is comparable or better than existing methods in the literature in practical scenarios. Python code files for all the experiments can be found at https://github.com/amina01/ESMIL.