MaskFactory: Towards High-quality Synthetic Data Generation for Dichotomous Image Segmentation

Dichotomous Image Segmentation (DIS) tasks require highly precise annotations, and traditional dataset creation methods are labor intensive, costly, and require extensive domain expertise. Although using synthetic data for DIS is a promising solution to these challenges, current generative models and techniques struggle with the issues of scene deviations, noise-induced errors, and limited training sample variability. To address these issues, we introduce a novel approach, Mask Factory, which provides a scalable solution for generating diverse and precise datasets, markedly reducing preparation time and costs. We first introduce a general mask editing method that combines rigid and non-rigid editing techniques to generate high-quality synthetic masks. Specially, rigid editing leverages geometric priors from diffusion models to achieve precise viewpoint transformations under zero-shot conditions, while non-rigid editing employs adversarial training and self-attention mechanisms for complex, topologically consistent modifications.